SYNOS

Atomic Layer Deposition
Atomic layer deposition (ALD) performed at high
throughput and low cost, which makes available
broader markets than just traditional high end
semiconductor manufacturing
Unique ALD system and process
technologies
Design & manufacture of high throughput ALD system
for large & flexible substrate
Resolved ALD processing problems originating from the
inefficiency in gas-solid reaction
Unique remote plasma technology to deposit
advantageous ALD films at extremely low temperature
for use in flexible OLED encapsulation application
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  • Direction USA, South Korea